PATTERN FORMING METHOD, ACTIVE-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTIVE-SENSITIVE OR RADIATION-SENSITIVE FILM

摘要

PURPOSE: A method for forming a pattern, an action-sensitive or radiation-sensitive resin, and an action-sensitive or radiation-sensitive film are provided to improve temperature and size uniformity. CONSTITUTION: A method for forming a pattern comprises: a step of forming a film using an action-sensitive or radiation-sensitive resin composition containing a solvent; a step of exposing the film to light; and a step of developing the film using a developing solution containing an organic solvent and forming a negative pattern.