发明名称 METHOD FOR SEPARATING SUBSTRATE, AND BONDING SUBSTRATE USING THE SAME AND PRODUCTION METHOD THEREOF
摘要 PURPOSE: A method for separating a substrate, a bonding substrate using the same and a production method thereof are provided to reduce the warpage of a substrate due to ion implantation by using a groove. CONSTITUTION: A groove is formed on a semiconductor substrate(100)(S301). Ions are injected into the semiconductor substrate having the groove to form an ion implantation layer(200)(S302). The semiconductor substrate is separated(S303).
申请公布号 KR20130024479(A) 申请公布日期 2013.03.08
申请号 KR20110087951 申请日期 2011.08.31
申请人 SAMSUNG CORNING PRECISION MATERIALS CO., LTD. 发明人 PARK, SEUNG YONG;LEE, BO HYUN;SHUR, JOONG WON;JANG, BONG HEE;YU, YULIA;KIM, MI KYOUNG;KIM, DONG WOON;KIM, DONG HYUN;KIM, MIN JU
分类号 H01L21/301;H01L21/20 主分类号 H01L21/301
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