| 摘要 |
PURPOSE: A substrate processing apparatus and a film forming apparatus are provided to prevent the deterioration of a throughput by quickly heating a substrate loaded on a rotary table. CONSTITUTION: A substrate processing apparatus includes a processing container, a rotary table(2), and a heater(41). The rotary table is installed in the processing container and loads a substrate(W) on one side thereof. The rotary table includes a table body(22) and a plurality of wafer loading plates. The wafer loading plate is formed in a substrate loading region and has a smaller thermal capacity than the table body. A heater heats the substrate from the other side of the rotary table. |
