发明名称 MICROWAVE PLASMA SOURCE AND PLASMA PROCESSING APPARATUS
摘要 A microwave plasma source (2) is provided with a microwave outputting section (30) which outputs plural divided microwaves, and a plurality of antenna modules (41) for guiding the plural divided microwaves into a chamber. Each antenna module (41) is provided with an amplifier section (42) having one or more amplifier (47) for amplifying a microwave, and an antenna section (44) having an antenna (51) for radiating the amplified microwave into the chamber, and a tuner (43) for adjusting impedance in a microwave transmission path. The tuner (43) is integrally arranged with the antenna section (44) to be located close to the amplifier (47).
申请公布号 KR101240842(B1) 申请公布日期 2013.03.08
申请号 KR20097001760 申请日期 2007.07.20
申请人 发明人
分类号 C23C16/511;H01L21/205;H01L21/3065;H05H1/46 主分类号 C23C16/511
代理机构 代理人
主权项
地址
您可能感兴趣的专利