发明名称 |
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PARTICLE BEAM WRITING METHOD |
摘要 |
In accordance with one aspect of this invention, a multi charged particle beam writing apparatus includes an aperture member, in which a plurality of openings are formed, configured to form multi-beams by making portions of the charged particle beam pass through the plurality of openings; a plurality of blankers configured to perform blanking-deflect regarding beams corresponding to the multi-beams; a writing processing control unit configured to control writing processing with a plurality of beams having passed through different openings among the plurality of openings being irradiated on the target object at a predetermined control grid interval; and a dose controlling unit configured to variably control a dose of a beam associated with deviation according to a deviation amount when an interval between the plurality of beams irradiated is deviated from the control grid interval.
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申请公布号 |
US2013056647(A1) |
申请公布日期 |
2013.03.07 |
申请号 |
US201213597699 |
申请日期 |
2012.08.29 |
申请人 |
YOSHIKAWA RYOICHI;OGASAWARA MUNEHIRO;NUFLARE TECHNOLOGY, INC. |
发明人 |
YOSHIKAWA RYOICHI;OGASAWARA MUNEHIRO |
分类号 |
G21K5/04 |
主分类号 |
G21K5/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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