发明名称 Method for Manufacturing Thin Film Transistor, Thin Film Transistor and Image Display Apparatus
摘要 A method for manufacturing a thin film transistor includes a first process of forming a gate electrode on a substrate; a second process of forming a gate insulation film so as to cover the gate electrode; a third process of forming a source electrode and a drain electrode on the gate insulation film; a fourth process of forming a semiconductor layer connected to the source electrode and the drain electrode; a fifth process of forming a protection film so as to overlap a portion of the source electrode and the drain electrode immediately above the semiconductor layer; and a sixth process of patterning the semiconductor layer using the protection film as a mask.
申请公布号 US2013056738(A1) 申请公布日期 2013.03.07
申请号 US201213629075 申请日期 2012.09.27
申请人 TOPPAN PRINTING CO., LTD.;TOPPAN PRINTING CO., LTD. 发明人 IKEDA NORIAKI;IMAMURA CHIHIRO;ITO MANABU
分类号 H01L33/08 主分类号 H01L33/08
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