发明名称 |
Method for Manufacturing Thin Film Transistor, Thin Film Transistor and Image Display Apparatus |
摘要 |
A method for manufacturing a thin film transistor includes a first process of forming a gate electrode on a substrate; a second process of forming a gate insulation film so as to cover the gate electrode; a third process of forming a source electrode and a drain electrode on the gate insulation film; a fourth process of forming a semiconductor layer connected to the source electrode and the drain electrode; a fifth process of forming a protection film so as to overlap a portion of the source electrode and the drain electrode immediately above the semiconductor layer; and a sixth process of patterning the semiconductor layer using the protection film as a mask. |
申请公布号 |
US2013056738(A1) |
申请公布日期 |
2013.03.07 |
申请号 |
US201213629075 |
申请日期 |
2012.09.27 |
申请人 |
TOPPAN PRINTING CO., LTD.;TOPPAN PRINTING CO., LTD. |
发明人 |
IKEDA NORIAKI;IMAMURA CHIHIRO;ITO MANABU |
分类号 |
H01L33/08 |
主分类号 |
H01L33/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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