发明名称 |
APPARATUS FOR OXIDATION AND ANNEALING PROCESSES AND METHOD FOR THE SAME |
摘要 |
The disclosure relates to an apparatus for oxidation and annealing processes comprising: a chamber; an oxidizing unit located in the chamber, where an oxidizing process for a subject to be processed is conducted; and an annealing unit located in the chamber, where an annealing process for the subject to be processed is conducted. Further, The disclosure relates to a method for the oxidation and annealing processes comprising: preparing a chamber comprising an oxidizing unit and an annealing unit; preparing a subject to be processed on a susceptor located in the oxidizing unit; oxidizing the subject to be processed; converting atmosphere of the oxidizing unit; transferring the subject to be processed to the annealing unit; and annealing the subject to be processed. |
申请公布号 |
WO2013032151(A2) |
申请公布日期 |
2013.03.07 |
申请号 |
WO2012KR06414 |
申请日期 |
2012.08.10 |
申请人 |
LG INNOTEK CO., LTD.;HEO, SEON;SON, CHANG HYUN |
发明人 |
HEO, SEON;SON, CHANG HYUN |
分类号 |
H01L21/316 |
主分类号 |
H01L21/316 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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