发明名称 APPARATUS FOR OXIDATION AND ANNEALING PROCESSES AND METHOD FOR THE SAME
摘要 The disclosure relates to an apparatus for oxidation and annealing processes comprising: a chamber; an oxidizing unit located in the chamber, where an oxidizing process for a subject to be processed is conducted; and an annealing unit located in the chamber, where an annealing process for the subject to be processed is conducted. Further, The disclosure relates to a method for the oxidation and annealing processes comprising: preparing a chamber comprising an oxidizing unit and an annealing unit; preparing a subject to be processed on a susceptor located in the oxidizing unit; oxidizing the subject to be processed; converting atmosphere of the oxidizing unit; transferring the subject to be processed to the annealing unit; and annealing the subject to be processed.
申请公布号 WO2013032151(A2) 申请公布日期 2013.03.07
申请号 WO2012KR06414 申请日期 2012.08.10
申请人 LG INNOTEK CO., LTD.;HEO, SEON;SON, CHANG HYUN 发明人 HEO, SEON;SON, CHANG HYUN
分类号 H01L21/316 主分类号 H01L21/316
代理机构 代理人
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