MONITORING DEVICE, MONITORING SYSTEM AND MONITORING METHOD

摘要

A monitoring device: measures a three dimensional shape in the surroundings of the monitoring device; estimates the self-position of the monitoring device by collating the measured three-dimensional shape with a self-position estimation map including the shape and position of structural objects inside a building excluding facility elements; extracts the facility elements in the periphery of the estimated self-position from a facility element collation map that includes the shape and position of facility elements inside the building; extracts the shape and position of a facility element candidate from the measured three-dimensional shape; calculates the degree of conformity between the shape and position of the facility element in the periphery of the self-position extracted from the facility element collation map and the shape and position of the facility element candidate extracted from the measured three-dimensional shape, on the basis of the error distribution of the shape and position of the facility element in the periphery of the self-position and the error distribution of the shape and position of the facility element candidate extracted from the measured three-dimensional shape; and identifies which of the facility elements in the surroundings of the self-position extracted from the facility element collation map is the shape of the facility element candidate extracted from the measured three-dimensional object on the basis of the calculated degree of conformity.