| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a salt useful as an acid generator for a resist composition, and to provide an excellent resist composition containing the salt, or the like. <P>SOLUTION: This salt is expressed by formula (1), where in formula (1), R<SP POS="POST">1</SP>represents an aromatic hydrocarbon group; R<SP POS="POST">2</SP>represents an acidolyzing group; R<SP POS="POST">3</SP>represents H or a hydroxy group; X<SP POS="POST">1</SP>and X<SP POS="POST">2</SP>each independently represent a group represented by formula (a-g1) (wherein, s denotes an integer of 0-2; A<SP POS="POST">10</SP>and A<SP POS="POST">11</SP>each independently represent an aliphatic hydrocarbon group; X<SP POS="POST">10</SP>represents O, a carbonyl group, carbonyloxy group or oxycarbonyl group), m1 denotes 1 or 2 and m2 denotes 0 or 1, provided that a relation m1+m2=2 is satisfied; A<SP POS="POST">-</SP>represents an organic anion selected from the group consisting of a sulfonic anion, sulfonylimide anion, sulfonylmethide anion and carboxylic anion. <P>COPYRIGHT: (C)2013,JPO&INPIT |
