发明名称 |
OPTICAL WAVEGUIDE FABRICATION METHOD |
摘要 |
The present invention relates to a method of manufacturing optical waveguide devices. The order of patterning/etch in the method is first a deeper etching then shallow etching. In some embodiments, the first etching forms a mesa and the second etching removes a portion of material that comprises the mesa. In addition, there can be a planarization step. The deeper trenches are desirably conducive to filling. The method may use a cross-lithography method to reduce alignment errors between multiple patterning/etching steps. The method may use an oxidation and stripping off process to smooth a surface of the waveguide and/or reduce an initial dimension of the waveguide. |
申请公布号 |
US2013056442(A1) |
申请公布日期 |
2013.03.07 |
申请号 |
US201113639823 |
申请日期 |
2011.04.29 |
申请人 |
LI BING;LI XIAOGANG;WANG ZHEHUI |
发明人 |
LI BING;LI XIAOGANG;WANG ZHEHUI |
分类号 |
B05D5/06;B05D3/10;B44C1/22 |
主分类号 |
B05D5/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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