| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an EUV (extreme ultraviolet) illumination system with measurement means that is capable of determining with sufficient accuracy a source position as well as a source power of an EUV light source, specifically of an EUV plasma light source, in regard to an effectively utilized wavelength. <P>SOLUTION: The EUV illumination system includes at least one EUV (extreme ultraviolet) light source (3), and an aperture stop and sensor device (1) for the measurement of intensity fluctuations and/or position changes of the EUV light source (3), in particular in the range of effectively utilized wavelengths, or of one of intermediate images of the EUV light source (3). The aperture stop and sensor device (1) has an aperture stop (2.1) and an EUV position sensor (2.3). The aperture stop and sensor device (1) is arranged in such a manner that the aperture stop (2.1) allows a predetermined solid angle range of radiation originating from the EUV light source (3) or from one of the intermediate images (7) to fall on the EUV position sensor (2.3). <P>COPYRIGHT: (C)2013,JPO&INPIT |
