| 发明名称 |
Multilayer Mirror |
| 摘要 |
There is provided a multilayer mirror (80) comprising a layer of a first material (84) and a layer of silicon (82). The layer of the first material and the layer of silicon form a stack of layers. An exposed region of the layer of silicon comprises a modification that is arranged to improve the robustness of the exposed region of silicon. |
| 申请公布号 |
US2013057840(A1) |
申请公布日期 |
2013.03.07 |
| 申请号 |
US201113698171 |
申请日期 |
2011.04.06 |
| 申请人 |
TIMOSHKOV VADIM IOURIEVICH;VAN SCHOOT JAN BERNARD PLECHELMUS;KEMPEN ANTONIUS THEODORUS WILHELMU;YAKUNIN ANDREI MIKHAILOVICH;OSORIO OLIVEROS EDGAR ALBERTO;ASML NETHERLAND B.V. |
发明人 |
TIMOSHKOV VADIM IOURIEVICH;VAN SCHOOT JAN BERNARD PLECHELMUS;KEMPEN ANTONIUS THEODORUS WILHELMU;YAKUNIN ANDREI MIKHAILOVICH;OSORIO OLIVEROS EDGAR ALBERTO |
| 分类号 |
G02B1/10;C23C14/14;G03B27/70 |
主分类号 |
G02B1/10 |
| 代理机构 |
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