发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 A semiconductor device includes: a semiconductor substrate having a main surface; an electrode in a device region on the main surface; a metal wiring on the main surface and having a first end connected to the electrode; an electrode pad outside the device region and spaced from the metal wiring; an air gap between the main surface and an air gap forming film on the main surface, enveloping the first end of the metal wiring and the electrode, and having a first opening; a resin closing the first opening and covering a second end of the metal wiring; a liquid repellent film facing the air gap and increasing contact angle of the resin, when liquid, relative to contact angles on the semiconductor substrate and the air gap forming film; and a metal film connecting the metal wiring to the electrode pad through a second opening located in the resin.
申请公布号 US2013056875(A1) 申请公布日期 2013.03.07
申请号 US201213545046 申请日期 2012.07.10
申请人 NOGAMI YOUICHI;KOYAMA HIDETOSHI;YAMAMOTO YOSHITSUGU;MITSUBISHI ELECTRIC CORPORATION 发明人 NOGAMI YOUICHI;KOYAMA HIDETOSHI;YAMAMOTO YOSHITSUGU
分类号 H01L23/482;H01L21/768 主分类号 H01L23/482
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