发明名称 FinFET Design Controlling Channel Thickness
摘要 System and method for controlling the channel thickness and preventing variations due to formation of small features. An embodiment comprises a fin raised above the substrate and a capping layer is formed over the fin. The channel carriers are repelled from the heavily doped fin and confined within the capping layer. This forms a thin-channel that allows greater electrostatic control of the gate.
申请公布号 US2013056795(A1) 申请公布日期 2013.03.07
申请号 US201113335689 申请日期 2011.12.22
申请人 WU ZHIQIANG;GOTO KEN-ICHI;HSIEH WEN-HSING;HO JON-HSU;WANG CHIH-CHING;HUANG CHING-FANG;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 WU ZHIQIANG;GOTO KEN-ICHI;HSIEH WEN-HSING;HO JON-HSU;WANG CHIH-CHING;HUANG CHING-FANG
分类号 H01L29/78;H01L21/20;H01L29/12;H01L29/36 主分类号 H01L29/78
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