| 摘要 |
PURPOSE: A substrate processing apparatus is provided to sufficiently prevent a mist from being attached to a dried substrate by improving exhaust efficiency and space efficiency. CONSTITUTION: A first process chamber receives a first section of a flow transfer path. The first process chamber includes an inlet(118) and an outlet(120) through which a substrate passes. A top air knife(122U) and a lower air knife(122L) diagonally spray gas for removing liquid and drying the substrate to the substrate in a reverse transfer direction. A blower(136) supplies air to the first process chamber on the lower side of the transfer direction than the top air knife and the bottom air knife. An exhaust chamber(160) is installed in the first process chamber to be lower than the outlet of the bottom air knife. A bottom exhaust(126,128) is installed in a sidewall facing an entrance of the exhaust chamber.
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