发明名称 |
ELECTROSTATIC CHUCK AND SEMICONDUCTOR/LIQUID CRYSTAL MANUFACTURING EQUIPMENT |
摘要 |
PURPOSE: An electrostatic chuck and an apparatus for manufacturing a semiconductor crystal are provided to improve the yield of an etching process on a wafer by securing the uniformity of a temperature on the wafer. CONSTITUTION: A wafer is loaded in a plurality of chuck regions. A chuck functioning unit(10) includes a concave part installed outside the chuck region and is bonded to a base plate(20) with an adhesive(26). An electrode(40) is arranged in the chuck functioning unit corresponding to the chuck region and the chuck functioning unit corresponding to the concave part. A plurality of lift pins(54) are arranged on the edge of an electrostatic chuck(1) to vertically move a tray(50). A focus ring(56) is installed on the outer side of the electrostatic chuck to limit plasma in the electrostatic chuck.
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申请公布号 |
KR20130023062(A) |
申请公布日期 |
2013.03.07 |
申请号 |
KR20120075809 |
申请日期 |
2012.07.12 |
申请人 |
SHINKO ELECTRIC INDUSTRIES CO., LTD. |
发明人 |
SHIRAIWA NORIO |
分类号 |
H01L21/683;B23Q3/15;H02N13/00 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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