发明名称 ELECTROSTATIC CHUCK AND SEMICONDUCTOR/LIQUID CRYSTAL MANUFACTURING EQUIPMENT
摘要 PURPOSE: An electrostatic chuck and an apparatus for manufacturing a semiconductor crystal are provided to improve the yield of an etching process on a wafer by securing the uniformity of a temperature on the wafer. CONSTITUTION: A wafer is loaded in a plurality of chuck regions. A chuck functioning unit(10) includes a concave part installed outside the chuck region and is bonded to a base plate(20) with an adhesive(26). An electrode(40) is arranged in the chuck functioning unit corresponding to the chuck region and the chuck functioning unit corresponding to the concave part. A plurality of lift pins(54) are arranged on the edge of an electrostatic chuck(1) to vertically move a tray(50). A focus ring(56) is installed on the outer side of the electrostatic chuck to limit plasma in the electrostatic chuck.
申请公布号 KR20130023062(A) 申请公布日期 2013.03.07
申请号 KR20120075809 申请日期 2012.07.12
申请人 SHINKO ELECTRIC INDUSTRIES CO., LTD. 发明人 SHIRAIWA NORIO
分类号 H01L21/683;B23Q3/15;H02N13/00 主分类号 H01L21/683
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