| 摘要 |
<P>PROBLEM TO BE SOLVED: To solve such a problem that a conventionally known resist composition does not necessarily exhibit sufficient line edge roughness (LER) in the production of a resist pattern. <P>SOLUTION: A resist composition is provided, comprising a salt expressed by formula (I) and a resin that is insoluble or hardly soluble with an alkali aqueous solution but can be dissolved in an alkali aqueous solution by an action of an acid. In formula (I), Q<SP POS="POST">1</SP>and Q<SP POS="POST">2</SP>are the same or different from each other, representing a fluorine atom or the like; L<SP POS="POST">1</SP>represents a 1-17C divalent aliphatic saturated hydrocarbon group, in which a methylene group constituting the divalent aliphatic saturated hydrocarbon group may be substituted with an oxygen atom or the like; X<SP POS="POST">1</SP>represent a single bond or -NR<SP POS="POST">1</SP>-; R<SP POS="POST">1</SP>represents a hydrogen atom or a 1-6C alkyl group; ring W represents a 3-36C aliphatic ring, in which a methylene group constituting the aliphatic ring may be substituted with an oxygen atom or the like, and a hydrogen atom included in the aliphatic ring may be substituted with a hydroxy group or the like; and Z<SP POS="POST">+</SP>represents an organic cation. <P>COPYRIGHT: (C)2013,JPO&INPIT |
