| 发明名称 |
METHOD FOR FORMING RESIST PATTERN AND COMPOSITION FOR FORMING PROTECTIVE FILM |
| 摘要 |
A method for forming a resist pattern includes providing a resist film. A protective film is provided on the resist film using a composition for forming the protective film. The composition includes a polymer and an organic solvent. The resist film on which the protective film is provided is exposed to irradiation with EUV light or an electron beam. The exposed resist film is developed. |
| 申请公布号 |
US2013059252(A1) |
申请公布日期 |
2013.03.07 |
| 申请号 |
US201213604810 |
申请日期 |
2012.09.06 |
| 申请人 |
MARUYAMA KEN;INUKAI KOJI;JSR CORPORATION |
发明人 |
MARUYAMA KEN;INUKAI KOJI |
| 分类号 |
C09D133/06;C08K5/05;C08K5/06;C09D129/02;C09D133/14;C09D137/00;G03F7/20 |
主分类号 |
C09D133/06 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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