ARRANGEMENTS AND METHOD FOR DETERMINING A CONTACT RESISTANCE OF ELECTRICALLY CONDUCTIVE LAYERS

摘要

The invention relates to an arrangement for determining the contact resistance of electrically conductive layers, which arrangement comprises: a layer structure, in which an electrically conductive first layer is applied to an electrically conductive second layer, wherein the first layer contacts the second layer in a contact zone; two current electrodes, wherein one current electrode is electrically connected with the first layer and the other current electrode with the second layer; two voltage metering electrodes, wherein one voltage metering electrode is connected with the first layer in a first metering zone, wherein the first metering zone results from a region of the first layer opposite to the contact zone and a region of the first layer extending said region in alignment transversely to the flow direction, and wherein the other voltage metering electrode is connected to the second layer in a second metering zone, wherein the second metering zone results from a region of the second layer extending the contact zone in alignment transversely to the current flow. In alternatives, the first layer comprises at least two layer sections that are separate from one another, which layer sections are contacted by the electrodes. The invention also extends to relevant methods for determining the contact resistance.