发明名称 LITHOGRAPHIC APPARATUS, SUBSTRATE TABLE AND DEVICE MANUFACTURING METHOD
摘要 PURPOSE: A lithography apparatus, a substrate table, and a method for manufacturing a device are provided to easily guide radiation emitted by wavelength conversion materials to a detector through a semiconductor chip by burying a waveguide in the semiconductor chip. CONSTITUTION: An alignment sensor(AS) includes a semiconductor chip(2), wavelength conversion materials(4), and a waveguide(5). The semiconductor chip includes one or more windows to transmit radiation. The wavelength conversion materials are located on the window. The waveguide is buried in the semiconductor chip and receives the radiation emitted by the wavelength conversion materials. The waveguide includes a core(6) and a cladding(7) surrounding the core. The core has a higher refractive index than the cladding.
申请公布号 KR20130023016(A) 申请公布日期 2013.03.07
申请号 KR20110132058 申请日期 2011.12.09
申请人 ASML NETHERLANDS B.V. 发明人 PROSYENTSOV VITALIY;VAN BENTEN JOHANNES MARIA
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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