POWER SUPPLY APPARATUS FOR GENERATING PLASMA, METHOD FOR SETTING PARAMETER FOR GENERATING PLASMA

摘要

Provided is a power supply apparatus for generating plasma, whereby a time required for impedance matching can be shortened, and process efficiency can be improved. This power supply apparatus for generating plasma is provided with: a reference signal generating unit for generating reference signals at a predetermined frequency; a power amplifying unit, which amplifies the reference signals and generates high frequency power signals; a detecting unit that detects traveling wave power and reflected wave power, which are included in the high frequency power signals; and a control unit, which changes amplification degree of the power amplifying unit by changing the frequency of the reference signals. During a first period of time, the reflected wave power is controlled to be at a first power value or less by fixing the reference signals to a first frequency, then, during a second period of time, plasma generating operations of sweeping the frequency of the reference signals are performed such that the reflected wave power is at a second power value or less, and performs plasma generating parameter setting operations to find out optimum values of the first frequency, the first period of time, and the second period of time.