发明名称 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PARTITION WALL, BLACK MATRIX AND OPTICAL ELEMENT
摘要 <p>Provided are: a negative photosensitive resin composition, which contains a pigment at high concentration and is capable of producing a black matrix that has high light shielding properties, which has high re-solubility, which is capable of providing a coating film by a slit coating method, said coating film being free from defects, and which has such a viscosity that enables coating by a slit coating method; a partition wall which is formed by curing the photosensitive resin composition and has high light shielding properties; and an optical element which has the partition wall. A negative photosensitive resin composition, which contains an alkali-soluble resin, a photopolymerization initiator, a black coloring agent and a solvent, and wherein the black coloring agent is contained in an amount of more than 20% by mass relative to the total solid content of the composition and the solvent contains a compound represented by R1O(C2H4O)2R2 (wherein R1 represents a methyl group and R2 represents an alkyl group having 2 or 3 carbon atoms) in an amount of 20-100% by mass relative to the total mass of the solvent; and a partition wall which is formed of a cured film of the negative photosensitive resin composition and which is formed to have such a shape that divides the surface of a substrate into a plurality of compartments for pixel formation.</p>
申请公布号 WO2013031736(A1) 申请公布日期 2013.03.07
申请号 WO2012JP71612 申请日期 2012.08.27
申请人 ASAHI GLASS COMPANY, LIMITED;YAMADA, KOTARO;TAKAHASHI, HIDEYUKI;KAWASHIMA, MASAYUKI;OBI, MASAKI 发明人 YAMADA, KOTARO;TAKAHASHI, HIDEYUKI;KAWASHIMA, MASAYUKI;OBI, MASAKI
分类号 G03F7/004;G02B5/20;G03F7/027;G03F7/031;H01L21/027;H01L51/50;H05B33/12;H05B33/22 主分类号 G03F7/004
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