发明名称 |
NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PARTITION WALL, BLACK MATRIX AND OPTICAL ELEMENT |
摘要 |
<p>Provided are: a negative photosensitive resin composition, which contains a pigment at high concentration and is capable of producing a black matrix that has high light shielding properties, which has high re-solubility, which is capable of providing a coating film by a slit coating method, said coating film being free from defects, and which has such a viscosity that enables coating by a slit coating method; a partition wall which is formed by curing the photosensitive resin composition and has high light shielding properties; and an optical element which has the partition wall. A negative photosensitive resin composition, which contains an alkali-soluble resin, a photopolymerization initiator, a black coloring agent and a solvent, and wherein the black coloring agent is contained in an amount of more than 20% by mass relative to the total solid content of the composition and the solvent contains a compound represented by R1O(C2H4O)2R2 (wherein R1 represents a methyl group and R2 represents an alkyl group having 2 or 3 carbon atoms) in an amount of 20-100% by mass relative to the total mass of the solvent; and a partition wall which is formed of a cured film of the negative photosensitive resin composition and which is formed to have such a shape that divides the surface of a substrate into a plurality of compartments for pixel formation.</p> |
申请公布号 |
WO2013031736(A1) |
申请公布日期 |
2013.03.07 |
申请号 |
WO2012JP71612 |
申请日期 |
2012.08.27 |
申请人 |
ASAHI GLASS COMPANY, LIMITED;YAMADA, KOTARO;TAKAHASHI, HIDEYUKI;KAWASHIMA, MASAYUKI;OBI, MASAKI |
发明人 |
YAMADA, KOTARO;TAKAHASHI, HIDEYUKI;KAWASHIMA, MASAYUKI;OBI, MASAKI |
分类号 |
G03F7/004;G02B5/20;G03F7/027;G03F7/031;H01L21/027;H01L51/50;H05B33/12;H05B33/22 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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