| 摘要 |
Disclosed is a photosensitive composition, which is capable of forming a partition wall that has an upper surface with sufficient liquid repellency and a lateral surface with good lypophilicity, said upper surface being free from development defects and exhibiting excellent liquid repellency even after a development process. The photosensitive composition is also capable of forming an opening portion that exhibits good wettability and spreadability for an ink. Specifically disclosed is a photosensitive composition, which is characterized by containing: a polymer that has a side chain having a group represented by formula (1) -CFXRf (wherein X represents a hydrogen atom, a fluorine atom or a trifluoromethyl group, and Rf represents a fluorine atom or a fluoroalkyl group having 1-20 carbon atoms and optionally having an ether oxygen atom), a side chain having a group represented by formula (2) -(R11-O)n-R12 (wherein R11 represents an alkylene group having 1-5 carbon atoms, R12 represents an alkyl group having 1-4 carbon atoms, and n represents an integer of 6-30), and a side chain having an ethylenic double bond; a photopolymerization initiator; and a photosensitive resin that has an acidic group and an ethylenic double bond. |
