| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an apparatus and a method, for executing maskless lithography more effectively. <P>SOLUTION: The apparatus comprise a projection system, a pattern forming device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto a substrate as an array of sub-beams of the radiation. The pattern forming device modulates the sub-beams of the radiation to substantially generate a requested dose pattern on the substrate. The low-pass filter executes calculation of pattern data derived from the requested dose pattern, thereby forming a frequency-clipped target dose pattern mainly including only spatial frequency components below a selected threshold frequency. The data manipulation device generates a control signal including spot exposure intensities to be generated by the patterning device, on the basis of a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. <P>COPYRIGHT: (C)2013,JPO&INPIT |
