发明名称 HOLDING APPARATUS, POSITION DETECTION APPARATUS AND EXPOSURE APPARATUS, MOVING METHOD, POSITION DETECTION METHOD, EXPOSURE METHOD, DETECTION SYSTEM ADJUSTMENT METHOD, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To determine a position of a detection system for detecting a position of a mark above an object with high accuracy. <P>SOLUTION: A holding apparatus comprises: force generators 122a - 122c, 124a, and 102 and driving devices 102, 126. The force generators can generate magnetic suction force and static pressure of gas between a detection system AL2<SB POS="POST">4</SB>provided below an FIA surface plate 102 and the surface plate so that a predetermined clearance is formed between the detection system and the surface plate. The driving units 102, 126 drive, in a state having the clearance (levitation state), the detection system at least in an uniaxial direction in a horizontal plane. Consequently, the detection system is not in contact with the surface plate and can make a move (positioning) with high accuracy. Moreover, when attractive force is set to be greater than repulsive force generated by the force generator, the detection system can be fixed (landed) with highly accurate positioning. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013048254(A) 申请公布日期 2013.03.07
申请号 JP20120213324 申请日期 2012.09.27
申请人 NIKON CORP 发明人 SHIBAZAKI YUICHI
分类号 H01L21/027;G03F9/00;H01L21/68 主分类号 H01L21/027
代理机构 代理人
主权项
地址