发明名称 |
A METHOD FOR CALCULATING AN OFFSET VALUE FOR ALIGNED DEPOSITION OF A SECOND PATTERN ONTO A FIRST PATTERN |
摘要 |
A method for calculating an offset value for aligned deposition of a second pattern onto a first pattern, comprising steps of: (a) loading a substrate with the first pattern on a surface of the substrate into a pattern recognition device at an original position inside the pattern recognition device; (b) determining a coordinate of a prescribed point of the first pattern by the pattern recognition device; (c) superimposing the second pattern onto the first pattern on the surface of the substrate; (d) bringing back the substrate with the first pattern and the second pattern into the original position inside the pattern recognition device; (e) determining a coordinate of a prescribed point of the second pattern by the pattern recognition device; wherein the prescribed point of the first pattern corresponds to the prescribed point of the second pattern; and (f) calculating the offset value between the first pattern and the second pattern. |
申请公布号 |
WO2012103188(A3) |
申请公布日期 |
2013.03.07 |
申请号 |
WO2012US22512 |
申请日期 |
2012.01.25 |
申请人 |
E. I. DU PONT DE NEMOURS AND COMPANY;INNOVALIGHT INC;MEISEL, ANDREAS |
发明人 |
MEISEL, ANDREAS |
分类号 |
H01L31/0224 |
主分类号 |
H01L31/0224 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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