| 摘要 |
<p>A semiconductor device comprises an MIS field effect transistor including a channel region made of p-conductive silicon, a gate insulating film including a first insulating film having dielectric constant higher than dielectric constant of silicon dioxide, and a gate electrode. The gate electrode includes a first metal film formed on the gate insulating film and having a work function greater than a work function of intrinsic semiconductor silicon, and a p-conductive silicon film formed on the first metal film and in contact with the first metal film.</p> |
