发明名称 SEPARATION CONTROL SUBSTRATE/TEMPLATE FOR NANOIMPRINT LITHOGRAPHY
摘要 <p>Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.</p>
申请公布号 EP2564271(A1) 申请公布日期 2013.03.06
申请号 EP20110720225 申请日期 2011.04.27
申请人 MOLECULAR IMPRINTS, INC. 发明人 IM, SE-HYUK;GANAPATHISUBRAMANIAN, MAHADEVAN;FLETCHER, EDWARD B.;KHUSNATDINOV, NIYAZ;SCHMID, GERARD;MEISSL, MARIO JOHANNES;CHERALA, ANSHUMAN;XU, FRANK Y.;CHOI, BYUNG-JIN;SREENIVASAN, SIDLGATA V.
分类号 G03F7/00;B29C45/76 主分类号 G03F7/00
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