| 摘要 |
PURPOSE: A wet cleaning device of a semiconductor wafer is provided to improve cleaning efficiency and uniformity by inserting a disk between semiconductor wafers and controlling the temperature of a disk. CONSTITUTION: A cleaning bath has a space to receiving a semiconductor wafer(W) for wet cleaning. A wafer guide moves the mounted semiconductor wafer and a disk(D) to a cleaning bath and includes a body part, a support part(122), and a handle part connected to the body part. The support part includes a plurality of slots to mount the disk and the semiconductor wafer. The plurality of slots are divided into a first slot(S1) for inserting the semiconductor wafer and a second slot(S2) for inserting the disk. The second slot is arranged between the first slots.
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