| 摘要 |
A substrate seating device for improving the droop the edge of the edge thereof is provided to maintain the distance between a substrate seating member and a gas distributing plate at the entire surface of the substrate, thereby improving greatly the process uniformity. A substrate seating device is installed at the inside of a chamber for forming a constant reaction space and includes a support plate(120). A support shaft(130) is connected with the lower portion of the support plate. A substrate seating member body(110) is mounted at the upper portion of the support plate and has a substrate seated thereon. Plural supporting members(140) are installed between the support plate and the substrate seating member body. The support member is fixed to the upper surface of the support plate and installed symmetrically with the center line as the reference. The support member has a semi-spherical shape and made of a coating layer with teflon materials. The support plate is made of ceramic materials with the high elastic coefficient. |
