发明名称 |
Advanced process control with novel sampling policy |
摘要 |
The present disclosure provides a semiconductor manufacturing method. The method includes performing a first process to a first plurality of semiconductor wafers; determining a sampling rate to the first plurality of semiconductor wafers based on process quality; determining sampling fields and sampling points to the first plurality of semiconductor wafers; measuring a subset of the first plurality of semiconductor wafers according to the sampling rate, the sampling fields and the sampling points; modifying a second process according to the measuring; and applying the second process to a second plurality of semiconductor wafers. |
申请公布号 |
US8392009(B2) |
申请公布日期 |
2013.03.05 |
申请号 |
US20090415366 |
申请日期 |
2009.03.31 |
申请人 |
FEI WANG JO;TSEN ANDY;FAN MING-YU;WANG JILL;MOU JONG-I;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
FEI WANG JO;TSEN ANDY;FAN MING-YU;WANG JILL;MOU JONG-I |
分类号 |
G06F19/00;G01R31/26;G01T1/24;G06F17/50;G06K9/00 |
主分类号 |
G06F19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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