| 摘要 |
PURPOSE: A device and a method for measuring the thickness of a thin film are provided to maintain a shape measuring function of high resolution by utilizing an entire numerical aperture of an objective lens having a high numerical aperture and to simultaneously enhance the accuracy of the thickness measuring function by utilizing the numerical aperture which is relatively low. CONSTITUTION: A device for measuring the thickness of a thin film comprises a first light source(210), a second light source unit(212), an optical system(230), a first detecting unit(240), and a second detecting unit(250). The second light source selectively irradiates lights of short wavelengths of a specific wavelength band to a passage of lights irradiated by the first light source. The optical system collects the lights irradiated by the first and second light sources in the thin film and includes an objective lens guiding the lights reflected by the thin film. The first detecting unit utilizes the lights guided by the optical system, thereby measuring the thickness of the thin film. The second detecting unit utilizes the lights guided by the optical system, thereby detecting the image information of the thin film. The second light source irradiates the lights of the short wavelengths while the first detecting unit measures the thickness of the thin film. The first detecting unit measures the thickness of the thin film by utilizing the lights except for the lights being overlapped with the lights of the short wavelengths irradiated by the second light source.
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