发明名称 Insulated gate bipolar transistor having contact region with variable width
摘要 An IGBT comprises trenches arranged in strips, first emitter diffusion layers formed so as to extend in a direction intersecting the trenches, and contact regions formed to have a rectangular shape. The portions of the contact regions on the first emitter diffusion layers have a smaller width than the other portions, the width extending in the direction intersecting the trenches. This configuration allows for an increase in the emitter ballast resistance of the emitter diffusion layers, resulting in enhanced resistance to electrical breakdown due to short circuit.
申请公布号 US8390097(B2) 申请公布日期 2013.03.05
申请号 US20070623932 申请日期 2007.01.17
申请人 HAMAGUCHI TAKUYA;HARUGUCHI HIDEKI;TSUNODA TETSUJIRO;MITSUBISHI ELECTRIC CORPORATION 发明人 HAMAGUCHI TAKUYA;HARUGUCHI HIDEKI;TSUNODA TETSUJIRO
分类号 H01L27/082 主分类号 H01L27/082
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