| 摘要 |
An electronic device can include a drain region of a transistor, a channel region of the transistor, and a doped region that is disposed under substantially all of the channel region, is not disposed under substantially all of a heavily doped portion of the drain region, and has a higher dopant concentration compared to the channel region. A process of forming an electronic device can include forming a drain region, a channel region, and a doped region, wherein the drain region has a conductivity type opposite that of the channel and doped region. After forming the drain, channel, and doped regions, the doped region is disposed under substantially all of the channel region, the doped region is not disposed under substantially all of a heavily doped portion of the drain region, and the drain region is laterally closer to the doped region than to the channel region. |
