METHOD FOR FORMING METAL LINE

摘要

PURPOSE: A method for forming a metal line is provided to prevent impact on a metal oxide layer in an etching process for a multi-metal layer made of Cu and metal oxide. CONSTITUTION: A metal oxide layer is formed on a substrate. A copper metal layer is formed on the metal oxide layer. A photoresist material is selectively left on the copper metal layer. An upper copper metal layer is etched by using etching solution which includes hydrogen peroxide, azole compound, phosphonic acid derivative, and water.