发明名称 |
Compositions and methods for removing organic substances |
摘要 |
Compositions and methods useful for the removal of organic substances from substrates, for example, electronic device substrates such as microelectronic wafers or flat panel displays, are provided. A method is presented which applies a minimum volume of the composition as a coating to the inorganic substrate whereby sufficient heat is added and immediately rinsed with water to achieve complete removal. These compositions and methods are particularly suitable for removing and completely dissolving photoresists of the positive and negative varieties as well as thermoset polymers from electronic devices.
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申请公布号 |
US8389455(B2) |
申请公布日期 |
2013.03.05 |
申请号 |
US201213346877 |
申请日期 |
2012.01.10 |
申请人 |
QUILLEN MICHAEL WAYNE;O'DELL DALE EDWARD;LEE ZACHARY PHILIP;MOORE JOHN CLEAON;MCENTIRE EDWARD ENNS;EASTMAN CHEMICAL COMPANY |
发明人 |
QUILLEN MICHAEL WAYNE;O'DELL DALE EDWARD;LEE ZACHARY PHILIP;MOORE JOHN CLEAON;MCENTIRE EDWARD ENNS |
分类号 |
C11D3/37;C11D3/43;C11D7/34 |
主分类号 |
C11D3/37 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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