发明名称 Method and apparatus for cathodic arc ion plasma deposition
摘要 A method and apparatus for depositing a coating material on a surface of a substrate by an ion plasma deposition process using a hollow cathode is disclosed. The cathode may be a substantially cylindrical hollow cathode. A plasma arc is formed on the outer circumference of the cathode to remove coating material from the cathode, which is then deposited on a surface of a substrate. An internal arc drive magnet is contained within the hollow bore of the cathode and cooling is provided to the magnet during operation.
申请公布号 US8387561(B2) 申请公布日期 2013.03.05
申请号 US20100965054 申请日期 2010.12.10
申请人 WEAVER SCOTT ANDREW;CARTER WILLIAM THOMAS;MARRUSO PAUL MARIO;GENERAL ELECTRIC COMPANY 发明人 WEAVER SCOTT ANDREW;CARTER WILLIAM THOMAS;MARRUSO PAUL MARIO
分类号 C23C16/00 主分类号 C23C16/00
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