发明名称 METHODS FOR IN-SITU GENERATION OF REACTIVE ETCH AND GROWTH SPECIE IN FILM FORMATION PROCESSES
摘要 Methods and apparatus are disclosed for the formation and utilization of metastable specie in a reaction chamber for processing substrates. The metastable specie may be used for etching the surface of substrates in situ, deposition processes during processing of the substrate.
申请公布号 KR101237868(B1) 申请公布日期 2013.03.04
申请号 KR20117000355 申请日期 2007.01.09
申请人 发明人
分类号 H01L21/3065 主分类号 H01L21/3065
代理机构 代理人
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