| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a processing device which can prevent suction force of a fan from being decreased by reducing possibility that foreign material such as process waste adheres to the fan. <P>SOLUTION: A processing device includes separation means 48 which is disposed in an exhaust path between a processing room and a fan and separates waste fluid included in exhaust gas flowed from the processing room into the exhaust path from gas. The separation means 48 includes: a separation chamber 54 which is constituted by a funnel-shaped lower chamber 50 and a cylindrical upper chamber 52; an intake port 58 communicating with the processing room; a gas exhaust port 60 communicating with the fan; a partition wall 61 facing the intake port which prevents the exhaust gas sucked by the intake port 58 from directly flowing into the gas exhaust port 60; and a waste fluid exhaust port 62. The exhaust gas sucked from the intake port 58 flows along an inner peripheral surface of the upper chamber 52 by the partition wall 61 and swirl air current 64 is generated in the separation chamber 54, therefore the waste fluid included in the exhaust gas is exhausted through the waste fluid exhaust port 62 and the exhaust gas is exhausted through the gas exhaust port 60. <P>COPYRIGHT: (C)2013,JPO&INPIT |
