发明名称 EXPOSURE METHOD, AND METHOD OF MANUFACTURING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To prepare correction information from a dynamic moving average. <P>SOLUTION: Correction information for correcting a measurement result in an encoder system is found by the dynamic moving average for finding a moving average using error information on the proper number of wafers in accordance with the degree of changes in errors between the measurement results of the encoder system and an interferometer system. Thereby, since the moving average is found using a large number of error information when the change of the error (X-X<SB POS="POST">0</SB>for instance) is small (section b for instance), errors generated at random can be efficiently suppressed, and since the moving average is found using error information for a small number of wafers when the error rapidly changes (section c for instance), a delay in response attendant on an abnormal value by the moving average can be avoided. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013045815(A) 申请公布日期 2013.03.04
申请号 JP20110181032 申请日期 2011.08.23
申请人 NIKON CORP 发明人 OKUTOMI SATOSHI
分类号 H01L21/027;H01L21/68 主分类号 H01L21/027
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