| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a device for exposing a mask pattern on a film-shaped object to be exposed that suppresses winkles occurring on an exposure surface and forms a mask pattern with high accuracy, and secures a space for arranging an alignment camera. <P>SOLUTION: A film exposure device 1 includes a film conveyance section 2, a photomask 3, a mask holding section 4 for holding the photomask 3 on an exposure surface a of an object F to be exposed, and a light irradiation section 5 for irradiating a mask pattern of the photomask 3 with light. The photomask 3 includes a first mask pattern 31 and a second mask pattern 32 which are arranged in a conveyance direction of the object F to be exposed. The film conveyance section 2 includes a pair of back rolls 21 and 22 which are arranged so as to correspond to the positions of the first mask pattern 31 and the second mask pattern 32, and the pair of the back rolls 21 and 22 support a surface in an opposite side to the exposure surface a. A space for arranging an alignment camera 6 is secured between the pair of the back rolls 21 and 22. <P>COPYRIGHT: (C)2013,JPO&INPIT |
