SUPPORT TABLE FOR LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To reduce influence of a localized heat load when using immersion fluid in a lithographic apparatus.

SOLUTION: A support table for a lithographic apparatus comprises: a support section and a regulation system. The support section and/or the regulation system are configured such that heat transfer due to operation of the conditioning system to or from a substrate supported on the support table is larger in a substrate region closer to the edge of the substrate than in a substrate region in the center of the substrate.

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