| 摘要 |
<P>PROBLEM TO BE SOLVED: To minimize deterioration of a seal member on the side where the plasma is likely to sneak, in a gate valve that is driven to open or close obliquely to the direction of taking in and out a wafer. <P>SOLUTION: The gate valve is provided in a gate through which a wafer is taken in or out of the chamber of a plasma processing apparatus, and is driven in a direction intersecting the direction of taking in and out a wafer obliquely. The gate valve includes a body 1, a seal portion 2 which is provided in the body 1 and abuts against the peripheral edge of the gate 10 when the gate valve is closed, and a protrusion 3 protruding from a surface of the body 1 where the seal portion 2 is provided, and forming a narrow gap 30 on the side where the plasma is likely to sneak, in front of the seal portion 2. <P>COPYRIGHT: (C)2013,JPO&INPIT |
