| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an adhesive film having adhesiveness at low temperature and formable of a pattern by an alkali developing solution. <P>SOLUTION: The adhesive film 1 contains a resin having an imide backbone in a main chain, obtained by reacting tetracarboxylic dianhydride with a diamine, a radiation polymerizable compound and a photoinitiator, wherein the diamine contains a specific aliphatic ether diamine in 10-90 mol% of the whole diamine. An adhesive pattern is formed by bonding the adhesive film 1 on an adherend, exposing the adhesive film 1, and then developing with a 2.38% solution of tetramethylammonium hydride, and another adherend can be bonded to the adherend through the adhesive pattern. <P>COPYRIGHT: (C)2013,JPO&INPIT |
