发明名称 NANOSTRUCTURED ORGANOSILICATES FROM THERMALLY CURABLE BLOCK COPOLYMERS
摘要 Provided are inorganic-organic block copolymers that self assemble without the addition of a precursor. The inorganic block of the polymers includes silicon and the organic block may be any organic polymer. The inorganic-organic block copolymers self assemble to form a material in which the inorganic polymer block may be crosslinked to produce an organosilicate and/or silica matrix, and further thermal curing of the matrix results in the formation of a porous nanostructured film.
申请公布号 WO2012148659(A3) 申请公布日期 2013.02.28
申请号 WO2012US32887 申请日期 2012.04.10
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION;BAJJURI, KRISHNA;DAI, QIU;NELSON, ALSHAKIM;RATHORE, JITENDRA 发明人 BAJJURI, KRISHNA;DAI, QIU;NELSON, ALSHAKIM;RATHORE, JITENDRA
分类号 C08G77/42;C08G77/06;C08J5/18;C08J9/00;C08L83/10 主分类号 C08G77/42
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