| 摘要 |
<p>Provided is a photosensitive resin composition comprising at least one each of an acid-modified resin containing ethylenic unsaturated groups, an inorganic filler, an ion scavenger of an inorganic compound having at least one metal selected from Zr, Bi, and Sb, a radical polymerizable monomer, a photopolymerization initiator, and a heat crosslinking agent, wherein the inorganic filler content accounts for at least 20 vol% of the total nonvolatile component content of the photosensitive resin composition, as well as a photosensitive film, a photosensitive laminate, a method for forming a permanent pattern, and a printed substrate.</p> |
