TFT ARRAY STRUCTURE AND MANUFACTURING METHOD

摘要

A TFT array structure and a manufacturing method. The structure includes: a first metal conductive layer (21), an interlayer (22), a second metal conductive layer (23), a passivation layer (24) and a black electrode layer (25). The first metal conductive layer (21) is formed on a substrate (20) by way of film formation and a first light cover; the interlayer (22) is formed on the first metal conductive layer (21) by way of deposition and a second light cover; the second metal conductive layer (23) is formed on the interlayer (22) by way of the etching of a third light cover; the passivation layer (24) is formed on the interlayer (22) and the second metal conductive layer (23) by way of deposition and the etching of a fourth light cover; and the black electrode layer (25) is formed on the passivation layer (24). The structure and manufacturing method reduce voltage loss and improve the performance of TFT liquid crystal displays.