Target, useful for sputtering substrates, comprises polygon-type flattened portions with decreasing angle of incidence to a horizontal line, where the target is present in the form of an elongated target for an elongated plasmatron

摘要

#CMT# #/CMT# The target comprises polygon-type flattened portions with decreasing angle of incidence to a horizontal line, where the target is present in the form of an elongated target for an elongated plasmatron with magnets on its rear side for the generation of a magnetic field having an arc-shaped curved field lines of a magnetic field before the target, and connections for a voltage source for forming a plasma before the target in a vacuum chamber (3). #CMT# : #/CMT# The target comprises polygon-type flattened portions with decreasing angle of incidence to a horizontal line, where the target is present in the form of an elongated target for an elongated plasmatron with magnets on its rear side for the generation of a magnetic field having an arc-shaped curved field lines of a magnetic field before the target, and connections for a voltage source for forming a plasma before the target in a vacuum chamber (3). The contour of the target on the front side of the course in a longitudinal cross-section lying opposite to the magnet follows one of the field lines of the magnetic field before the target so that the target is viewed in a cross-section and the field line has the same strength. The target viewed in a longitudinal cross-section is graded in a staircase-shaped manner in such a way that a middle top step of the staircase forms a highest point, and other step of the staircase (14) follows the course of a curved line (16) and is stepped down on both sides. Two lower lateral stairs are provided on both sides of the middle stair. Stair edges of the middle stair and the lateral stair extend along a straight line as secant, where the straight line intersects one of the arc-shaped field lines of the magnetic fields. The stair edges are contacted with the common curved line. The curved line extends along one of the arc-shaped field lines before the target. The staircase-shaped gradations of the target in a longitudinal extension of the plasmatron follow the course of the magnets in a cathode base body in such a way that the staircase-shaped gradations of the target extend longitudinally parallel to each other and follow the respective arc-shaped field lines. The arc-shaped field lines merge, into one another, at longitudinal ends of the plasmatron. The highest flattened portions are aligned horizontally, and form the secant of the common arc extending from the side edges of the target. The magnetic field follows the course of the curved line. Wedge-shaped end segments are formed at both longitudinal ends of the target, and outwardly increase in a flat angle along a longitudinal axis of symmetry of the target. #CMT#USE : #/CMT# The target is useful for sputtering substrates. #CMT#ADVANTAGE : #/CMT# The target is capable of effectively sputtering the substrates with improved service life and less consumption of energy. #CMT#DESCRIPTION OF DRAWINGS : #/CMT# The figure shows a schematic cross-sectional view of a target. 3 : Vacuum chamber 9 : Wall 12 : Shields 14 : Other step of the staircase 16 : Curved line.