发明名称 ASYMMETRIC PATTERN PROJECTION APPARATUS
摘要 <p>ASYMMETRIC PATTERN PROJECTION APPARATUSAn apparatus for inspection of a surface of a device comprises a projection module operative to project a pattern along a projection axis of the projection module onto the device. An imaging module receives an image of the pattern reflected from the device along an imaging axis of the imaging module onto animage sensor. A lens comprised in the imaging module has a first magnification in a first direction orthogonal to the imaging axis and a second magnification different from the first magnification in a second direction orthogonal to both the first direction and the imaging axis, which produces different fields of view of the image sensor and resolutions of the image in the first and second directions.(FIG. 5)</p>
申请公布号 SG187355(A1) 申请公布日期 2013.02.28
申请号 SG20120053146 申请日期 2012.07.18
申请人 ASM TECHNOLOGY SINGAPORE PTE LTD 发明人 ZHANG ZHUANYUN;WANG RAN SHI
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