| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an abrasive excellent in corrosion suppression performance in relation to a cobalt layer while maintaining suitable polishing speed to the cobalt layer, and a method for polishing a substrate. <P>SOLUTION: An abrasion for polishing a layer including a cobalt element contains a carboxylic acid derivative, a metal anticorrosive and water, and has a pH of 4.0 or less, the carboxylic acid derivative comprising at least one selected from the group consisting of a phthalic acid compound, an isophthalic acid compound, an alkyl dicarboxylic acid compound represented by the general formula (I), and a salt and acid anhydride thereof. In the general formula (I), R represents an alkylene group having 4-10 carbon atoms. HOOC-R-COOH...(I) <P>COPYRIGHT: (C)2013,JPO&INPIT |
